PLASMIC | Plasma Technology for Industry

Advancing Industrial Innovation with Plasma Technology

PLASMIC combines plasma technology, spectroscopy, and system integration to develop deployable products and solutions for advanced manufacturing and environmental monitoring.

Our current focus is Solution Microplasma OES for online metal ion analysis.

0.1 ppm
Detection precision
±5%
Compared with lab analysis
30+
Detectable metal elements
<30 min
Online monitoring interval

Multi-metal monitoring data

High-frequency monitoring

Live
CuCopper
9.8 ppm
NiNickel
8.4 ppm
ZnZinc
3.1 ppm
PbLead
0.6 ppm

Core Value

From Measurements to Actionable Process Data

01

Reduce data gaps caused by offline sampling

02

Monitor trends across 30+ metal elements

03

Help process, quality, and EHS teams make faster decisions

Products

Products and Solutions

Built on plasma technology, we develop innovative equipment and applications deployable in industrial environments, serving advanced manufacturing and environmental monitoring needs.

PLASMIC online metal ion analyzer

Online monitoring

Track metal changes in process liquids and water systems.

Multi-element analysis

Supports trend evaluation across 30+ metal elements.

Production-side deployment

Can be planned as bypass or near-line deployment.

Application validation

Build analysis conditions around customer samples.

Detectable elements

Multi-metal monitoring for precious-metal process evaluation

Precious metalsDetectable elements
H
He
Li
Be
B
C
N
O
F
Ne
Na
Mg
Al
Si
P
S
Cl
Ar
K
Ca
Sc
Ti
V
Cr
Mn
Fe
Co
Ni
Cu
Zn
Ga
Ge
As
Se
Br
Kr
Rb
Sr
Y
Zr
Nb
Mo
Tc
Ru
Rh
Pd
Ag
Cd
In
Sn
Sb
Te
I
Xe
Cs
Ba
57–71
Hf
Ta
W
Re
Os
Ir
Pt
Au
Hg
Tl
Pb
Bi
Po
At
Rn
Fr
Ra
89–103
Rf
Db
Sg
Bh
Hs
Mt
Ds
Rg
Cn
Nh
Fl
Mc
Lv
Ts
Og

Supports acidic and alkaline samples, excluding hydrofluoric acid. Detectable elements can be expanded for specific applications; final targets and concentration ranges are validated against sample conditions.

Applications

For Advanced Wet Processes and Water-System Monitoring

PLASMIC can be validated for different process liquids and water samples, helping customers assess the value of online metal ion monitoring for process control, quality management, and EHS tracking.

PCB Wet Process

Track metal concentration changes in process baths and reduce data gaps between scheduled lab sampling.

Cu, Ni, Zn

IC Substrate

Evaluate key metal trend monitoring for advanced substrate wet processes.

Cu, Ni, Pd

ENEPIG Process

Support monitoring of nickel, palladium, and gold bath changes.

Ni, Pd, Au

Plating & Surface Finishing

Observe plating-bath metal changes continuously for abnormal-trend review.

Cu, Ni, Zn

Industrial Water & Wastewater

Track metal trends across water-treatment stages for EHS management.

Cu, Ni, Pb

Semiconductor Wet Process

Evaluate metal monitoring and traceability needs based on process-liquid conditions.

Cu, Ni, Fe

News & Updates

Recent Updates

Follow PLASMIC's latest developments, exhibitions, and partnerships.